EFFECTIVE MASS OF HE-3 IMPURITIES IN HE-4 FILMS

被引:22
作者
EPSTEIN, JL
KROTSCHECK, E
SAARELA, M
机构
[1] TEXAS A&M UNIV SYST,DEPT PHYS,COLLEGE STN,TX 77843
[2] UNIV OULU,DEPT THEORET PHYS,SF-90570 OULU,FINLAND
关键词
D O I
10.1103/PhysRevLett.64.427
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We calculate the effective mass of He3 impurity atoms in a film of liquid He4 atoms adsorbed to a substrate. The calculated effective mas of the He3 impurity shows a strong dependence on the structure of the underlying He4 film. When both the coupling of the He3 impurity to the background and to other He3 impurities are taken into account, our values agree well with recent experiments by Wang and Gasparini [Phys. Rev. B 38, 11 245 (1988)]. It is suggested that the Fermi-liquid contribution to the effective mass is experimentally obsrevable. © 1990 The American Physical Society.
引用
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页码:427 / 430
页数:4
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