MECHANICAL BEHAVIOR OF CHEMICAL VAPOR-DEPOSITED TUNGSTEN

被引：6

作者：

CHUN, JS ^{[1
]}

SHIM, HS ^{[1
]}

BYRNE, JG ^{[1
]}

机构：

[1] UNIV UTAH,DIV MAT SCI & ENGN,SALT LAKE CITY,UT 84112

来源：

METALLURGICAL TRANSACTIONS | 1972年 / 3卷 / 12期

关键词：

D O I：

10.1007/BF02661318

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：3093 / 3096

页数：4

共 7 条

[1] CHEMICAL VAPOR DEPOSITED TUNGSTEN - MECHANICAL EVALUATION AT HIGH TEMPERATURES
CHUN, JS
NICHOLSON, PS
SOSIN, A
BYRNE, JG
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (09) : 1492 - +
[2] HALL RW, 1959, NASA3959E MEM
[3] HOLMAN WR, 1967, P C CHEM VAP DEP REF, P427
[4] SELL HG, 1962, WADDTR6037 AER SYST
[5] SHIM H, 1971, 3 INT C CRYST GROWTH
[6] Shim H. S., 1972, Journal of Crystal Growth, V13-14, P410, DOI 10.1016/0022-0248(72)90195-9
[7] TENSILE PROPERTIES OF PYROLYTIC TUNGSTEN FROM 1370-DEGREES-C TO 2980-DEGREES-C IN VACUUM
TAYLOR, JL
BOONE, DH
[J]. JOURNAL OF THE LESS-COMMON METALS, 1964, 6 (02): : 157 - 164