SIMULTANEOUS UNDERPOTENTIAL DEPOSITION OF LEAD AND THALLIUM ON POLYCRYSTALLINE SILVER .2.

被引：13

作者：

BHARATHI, S ^{[1
]}

YEGNARAMAN, V ^{[1
]}

RAO, GP ^{[1
]}

机构：

[1] CENT ELECTROCHEM RES INST,KARAIKKUDI 623006,TAMIL NADU,INDIA

来源：

ELECTROCHIMICA ACTA | 1991年 / 36卷 / 08期

关键词：

UNDERPOTENTIAL DEPOSITION (UPD); POLYCRYSTALLINE SILVER; NUCLEATION GROWTH;

D O I：

10.1016/0013-4686(91)80007-U

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Simultaneous deposition of lead and thallium UPDs on polycrystalline silver has been investigated under cyclic voltammetric conditions. Voltammetric data, resulting from systematic variation of potential sweep rates and concentration of metal ions, are presented and discussed. The experimental results for composite lead and thallium UPDs, obtained from mixed as well as single metal UPDs, obtained from single salt solutions under comparable conditions, have been analysed in terms of the empirical models proposed for the growth mechanism based on adsorption/nucleation phenomena.

引用

页码：1291 / 1295

页数：5

共 15 条

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[13]

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[15]

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