HIGHLY SENSITIVE SELF DEVELOPING ELECTRON-BEAM RESIST OF ALDEHYDE CO-POLYMER

被引：14

作者：

HATADA, K

KITAYAMA, T

DANJO, S

YUKI, H

ARITOME, H

NAMBA, S

NATE, K

YOKONO, H

机构：

[1] HITACHI LTD,PROD ENGN RES LAB,TOTSUKA KU,YOKOHAMA 244,JAPAN

[2] OSAKA UNIV,FAC ENGN SCI,DEPT ELECT ENGN,TOYONAKA,OSAKA 560,JAPAN

来源：

POLYMER BULLETIN | 1982年 / 8卷 / 9-10期

关键词：

D O I：

10.1007/BF00265269

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：469 / 472

页数：4

共 10 条

[1] VAPOR DEVELOPMENT OF POLY(OLEFIN SULFONE) RESISTS [J].

BOWDEN, MJ ;

THOMPSON, LF .

POLYMER ENGINEERING AND SCIENCE, 1974, 14 (07) :525-528

[2]

DOLE M, 1973, RAD CHEM MACROMOLECU, V2, P101

[3]

SUKEGAWA K, 1982, Patent No. 8224801

[4] ISOMORPHISM PHENOMENA IN POLYALDEHYDES [J].

TANAKA, A ;

ENDO, S ;

HATADA, K ;

HOZUMI, Y ;

FUJISHIGE, R .

JOURNAL OF POLYMER SCIENCE PART B-POLYMER LETTERS, 1964, 2 (2PB) :181-&

[5]

TANAKA A, 1965, KOBUNSHI KAGAKU, V22, P317

[6]

TANAKA A, 1965, KOBUNSHI KAGAKU, V22, P321

[7]

TANAKA A, 1965, KOBUNSHI KAGAKU, V22, P216

[8]

TANAKA A, 1965, KOBUNSHI KAGAKU, V22, P220

[9]

TANAKA A, 1964, KOBUNSHI KAGAKU, V21, P694

[10]

WILLSON CG, 1982, 28TH P IUPAC MACR S, P448

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