CRYSTALLOGRAPHY OF EPITAXIAL-GROWTH OF WURTZITE-TYPE THIN-FILMS ON SAPPHIRE SUBSTRATES

被引:81
作者
KUNG, P
SUN, CJ
SAXLER, A
OHSATO, H
RAZEGHI, M
机构
[1] Center for Quantum Devices, Electrical Engineering and Computer Science Department, Northwestern University, Evanston
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.355943
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this article, we present a crystallographic model to describe the epitaxial growth of wurtzite-type thin films such as gallium nitride (GaN) on different orientations of sapphire, (Al2O3) substrates. Through this model, we demonstrate the thin films grown on (00.1)Al2O3 have a better epilayer-substrate interface quality than those grown on (01.2)Al2O3. We also show the epilayer grown on (00.1)Al2O3 are gallium-terminated, and both (00.1) and (01.2) surfaces of sapphire crystals are oxygen-terminated.
引用
收藏
页码:4515 / 4519
页数:5
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