ELECTRODE EFFECTS IN ELECTRICAL MEASUREMENTS IN SI0 THIN-FILMS

被引：4

作者：

NGUYEN, TP

MINN, S

机构：

[1] Laboratoire de Physique, Solide - Faculté des Sciences de Nantes, 44072 Nantes Cédex, 2, chemin de la Houssinière

来源：

SOLID STATE COMMUNICATIONS | 1979年 / 31卷 / 04期

关键词：

D O I：

10.1016/0038-1098(79)90601-X

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

We report results obtained from thermally stimulated current and capacitance measurements of metal-SiO-metal structures having different metals for the electrodes. Dependence of relaxed charge on the polarized electrode suggests the existence of space charge near the metal-insulator interface. The measurements of capacitance under superimposed DC voltages support this interpretation and show that space charge is not negligible at high fields. The density of lacalised states evaluated from the data is of the order of 1017 cm-3. © 1979.

引用

页码：233 / 236

页数：4

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