EFFECTS OF BORONIZATION OF THE 1ST WALL IN TFTR

A plasma-enhanced CVD process was used to deposit thin (40-100 nm), amorphous carbon/boron films onto the first wall of TFTR. A series of plasma experiments was performed to test the effect of this first-wall modification on low-Z impurity (carbon, oxygen) behavior, suppression of metallic impurities, post-disruption recovery, hydrogenic recycling, and plasma density limits. The analysis of the plasma performance following the first few boronization attempts on TFTR shows: (1) suppression by a factor of 1.5-3 of carbon impurities immediately after boronization, although this suppression is short-lived (approximately 10 shots); (2) long term suppression of oxygen and metallic impurities by a factor of two; (3) significant suppression of oxygen impurity emission following disruptions and during pulse discharge cleaning; and (4) no significant change in hydrogenic recycling properties in comparison to the pre-existing carbon first wall.