SPECIAL APPLICATION COATINGS FOR THE VACUUM ULTRAVIOLET (VUV)

被引:4
作者
FLINT, BK
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D O I
10.1117/12.7972327
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
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页码:92 / 97
页数:6
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共 12 条
[1]   DEPOLARIZATION EFFECTS IN PULSED PHOTOIONIZATION OF STATE-SELECTED LITHIUM [J].
ALGUARD, MJ ;
CLENDENIN, JE ;
COOPER, PS ;
EHRLICH, RD ;
HUGHES, VW ;
LUBELL, MS ;
BAUM, G ;
SCHULER, KP .
PHYSICAL REVIEW A, 1977, 16 (01) :209-212
[2]   INTERFERENCE FILTERS FOR FAR ULTRAVIOLET (1700 A TO 2400 A) [J].
BATES, B ;
BRADLEY, DJ .
APPLIED OPTICS, 1966, 5 (06) :971-&
[3]  
Behrndt K. H., 1966, PHYS THIN FILMS, V3, P1
[4]   HIGH-PRESSURE XENON LASER AT 1730-A [J].
GERARDO, JB ;
JOHNSON, AW .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1973, QE 9 (07) :748-755
[5]   REFLECTING COATINGS FOR THE EXTREME ULTRAVIOLET [J].
HASS, G ;
TOUSEY, R .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1959, 49 (06) :593-602
[6]   OBSERVATIONS OF STIMULATED EMISSION FROM HIGH-PRESSURE KRYPTON AND ARGON-XENON MIXTURES [J].
HOFF, PW ;
SWINGLE, JC ;
RHODES, CK .
APPLIED PHYSICS LETTERS, 1973, 23 (05) :245-246
[7]  
HOFF PW, 1973, OPT COMMUN, V8, P128
[8]   126.1-NM MOLECULAR ARGON LASER [J].
HUGHES, WM ;
SHANNON, J ;
HUNTER, R .
APPLIED PHYSICS LETTERS, 1974, 24 (10) :488-490
[9]   ON CAUSE OF ERRORS IN REFLECTANCE VS ANGLE OF INCIDENCE MEASUREMENTS AND DESIGN OF REFLECTOMETERS TO ELIMINATE ERRORS [J].
HUNTER, WR .
APPLIED OPTICS, 1967, 6 (12) :2140-&
[10]   ON VACUUM-ULTRAVIOLET REFELECTANCE OF EVAPORATED ALUMINUM BEFORE AND DURING OXIDATION [J].
MADDEN, RP ;
HASS, G ;
CANFIELD, LR .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1963, 53 (05) :620-&