PREPARATION OF AS-DEPOSITED YB-BA-CU-O SUPERCONDUCTING FILMS BY DC ARC-DISCHARGE EVAPORATION METHOD

被引：2

作者：

NOHIRA, H

ISHIWARA, H

机构：

[1] Research Laboratory of Precision Machinery and Electronics, Tokyo Institute of Technology, Yokohama

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1990年 / 29卷 / 12期

关键词：

THIN FILM; HIGH TC; OXIDE SUPERCONDUCTOR; YB-BA-CU-O; ARC DISCHARGE;

D O I：

10.1143/JJAP.29.L2466

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new process using DC arc discharge evaporation is presented for preparing as-deposited superconducting Yb-Ba-Cu-O films on insulating substrates. In this method, it is necessary to alternate the applied bias direction periodically during film deposition in order to obtain stoichiometric composition films. It was found from SIMS analysis that the periodic change of the composition did not diffuse out in the film even after annealing at 800-degrees-C for 2 h. Thus, the alternation period was shortened to about 1 nm. The resultant film deposited on SrTiO3(100) at 700-degrees-C showed zero resistivity at 75 K.

引用

页码：L2466 / L2468

页数：3

共 5 条

[1] Guile A. E., 1971, P IEE IEE REV, V118, P1132
[2] PREPARATION OF YB-BA-CU-O SUPERCONDUCTING FILMS USING AN ARC-DISCHARGE EVAPORATION METHOD
ISHIWARA, H
NOHIRA, H
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1989, 28 (05): : L816 - L818
[3] CRYSTALLINE QUALITIES AND CRITICAL CURRENT DENSITIES OF AS-GROWN BA2YCU3OX THIN-FILMS ON SILICON WITH BUFFER LAYERS
MYOREN, H
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OSAKA, Y
NISHIYAMA, F
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1990, 29 (06): : L955 - L957
[4] AS-DEPOSITED Y-BA-CU-O SUPERCONDUCTING FILMS ON SILICON AT 400-DEGREES-C
WITANACHCHI, S
PATEL, S
KWOK, HS
SHAW, DT
[J]. APPLIED PHYSICS LETTERS, 1989, 54 (06) : 578 - 580
[5] SUPERCONDUCTIVITY AT 93-K IN A NEW MIXED-PHASE Y-BA-CU-O COMPOUND SYSTEM AT AMBIENT PRESSURE
WU, MK
ASHBURN, JR
TORNG, CJ
HOR, PH
MENG, RL
GAO, L
HUANG, ZJ
WANG, YQ
CHU, CW
[J]. PHYSICAL REVIEW LETTERS, 1987, 58 (09) : 908 - 910

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