MONO-MOLECULAR RESISTS - A NEW APPROACH TO HIGH-RESOLUTION ELECTRON-BEAM MICROLITHOGRAPHY

被引：2

作者：

BARRAUD, A

ROSILIO, C

RUAUDELTEIXIER, A

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570330

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2003 / 2007

页数：5

共 12 条

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[6] FUNDAMENTAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY .1. DEPTH-DOSE RESPONSE OF POLYMERIC ELECTRON-BEAM RESISTS [J].

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