INFLUENCE OF SOS REPAIR ON THE SPECIFICITY OF RADIATION MUTAGENESIS IN BACTERIOPHAGE PHI-X174

被引:5
作者
BLEICHRODT, JF
ROOSVERHEIJ, WSD
机构
[1] Medical Biological Laboratory TNO, Rijswijk Z.H., 2280 AA
来源
MOLECULAR & GENERAL GENETICS | 1979年 / 176卷 / 02期
关键词
D O I
10.1007/BF00273209
中图分类号
Q5 [生物化学]; Q7 [分子生物学];
学科分类号
071010 ; 081704 ;
摘要
The ochre mutant oc9 of bacteriophage φ{symbol}X174 was irradiated with γ-rays and the revertants were assayed on unirradiated and UV-irradiated host bacteria carrying an amber suppressor. The yield of revertants (amber+wild type) was higher on UV-irradiated than on unirradiated bacteria, showing that γ-irradiated φ{symbol}X174 was subjected to W-mutagenesis. For oc9 γ-irradiated in the presence of oxygen the fraction of amber mutants among the revertants was lower when mutants were scored on UV-irradiated bacteria than when assayed on unirradiated indicator cells. The same fraction of ambers was obtained when mutants were assayed on unirradiated and UV-irradiated samples of a recA indicator strain. UV-irradiated φ{symbol}X174 showed a similar phenomenon. These results suggest that the specificity with regard to insertion of bases opposite radiation damage in φ{symbol}X174 DNA is different for host cells in which SOS repair has been induced and cells in which SOS repair is not operative. © 1979 Springer-Verlag.
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页码:155 / 160
页数:6
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