INSITU SCANNING TUNNELING MICROSCOPY OBSERVATION OF ELECTROLESS-DEPOSITED NIP FILM

被引：6

作者：

HOMMA, T

YAMAZAKI, T

KUBOTA, T

OSAKA, T

机构：

[1] Department of Applied Chemistry, School of Science and Engineering, Waseda University, Ohubo, Shinjuku-ku, Tokyo

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1990年 / 29卷 / 11期

关键词：

Electroless-plating; In situ observation; Initial deposition process; Scanning tunneling microscopy;

D O I：

10.1143/JJAP.29.L2114

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Preliminary results of an in situ scanning tunneling microscopy (STM) observation of electroless-deposited NiP film as well as that of electrodeposited film were demonstrated. The electroless-deposited film is observed to develop rough features consisting of small grains, suggesting the successive nucleation of the grains and their three-dimensional growth. The electro-deposited film, in contrast, consists of larger grains with smooth features. © 1990 IOP Publishing Ltd.

引用

页码：L2114 / L2117

页数：4

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