GLOW PLASMA TREATMENT AT ATMOSPHERIC-PRESSURE FOR SURFACE MODIFICATION AND FILM DEPOSITION

被引：62

作者：

KANAZAWA, S

KOGOMA, M

OKAZAKI, S

MORIWAKI, T

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 37-8卷

关键词：

D O I：

10.1016/0168-583X(89)90310-8

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

收藏

页码：842 / 845

页数：4

相关论文

共 3 条

[1] STABLE GLOW PLASMA AT ATMOSPHERIC-PRESSURE [J].

KANAZAWA, S ;

KOGOMA, M ;

MORIWAKI, T ;

OKAZAKI, S .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1988, 21 (05) :838-840

[2]

Kanazawa S, 1987, P 8 INT S PLASM CHEM, P1839

[3] WETTABILITY CONTROL OF A PLASTIC SURFACE BY CF4-O2 PLASMA AND ITS ETCHING EFFECT [J].

KOGOMA, M ;

KASAI, H ;

TAKAHASHI, K ;

MORIWAKI, T ;

OKAZAKI, S .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1987, 20 (01) :147-149