共 3 条
[1]
Bohlen, Behringer, Keyser, Nehmiz, Zapka, Kulcke, High Throughput Submicron Lithography with Electron Beam Proximity Printing, Solid State Technology, (1984)
[2]
Behringer, Stolz, Trumpp, Greschmer, Silicon Masks for an Electron Beam Proximity Printer Achieved by Reactive Ion Etching (RIE), Proceedings of the 2. Conference for Study on Dry Etching in Microelectronic
[3]
Meissner, Haug, Silverman, Sonschik, Electron-beam proximity printing of half-micron devices, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 7, 6, pp. 1443-1447, (1989)