The theory of photoelasticity

被引：77

作者：

Mueller, H ^{[1
]}

机构：

[1] Massachusetts Inst Technol, Dept Phys, Cambridge, MA USA

来源：

关键词：

D O I：

10.1111/j.1151-2916.1938.tb15726.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：27 / 33

页数：7

共 17 条

[1]

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[2]

Banerjee K., 1927, INDIAN J PHYS, V2, P195

[3]

COCKER EG, 1931, PHOTOELASTICITY

Fajans, K ;

Joos, G .

ZEITSCHRIFT FUR PHYSIK, 1924, 23 :1-46

[5]

HAVELOCK TH, 1908, P ROY SOC A, V80, P28

[6] The theory of forced double refraction [J].

Herzfeld, KF ;

Lee, RH .

PHYSICAL REVIEW, 1933, 44 (08) :0625-0631

[7] On the theory of forced double refraction (photoelasticity) [J].

Herzfeld, KF .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA AND REVIEW OF SCIENTIFIC INSTRUMENTS, 1928, 17 (01) :26-36

[8] Theory of the photoelastic effect of cubic crystals [J].

Mueller, H .

PHYSICAL REVIEW, 1935, 47 (12) :0947-0957

[9] Theory of photoelasticity in amorphous solids [J].

Mueller, Hans .

PHYSICS-A JOURNAL OF GENERAL AND APPLIED PHYSICS, 1935, 6 (01) :179-184

[10]

Smyth C. P., 1931, DIELECTRIC CONSTANT