CRITICAL OVERPOTENTIAL FOR COPPER DENDRITE FORMATION

被引：24

作者：

POPOV, KI

DJUKIC, LM

PAVLOVIC, MG

MAKSIMOVIC, MD

机构：

[1] Faculty of Technology and Metallurgy, University of Beograd, Beograd

来源：

JOURNAL OF APPLIED ELECTROCHEMISTRY | 1979年 / 9卷 / 04期

关键词：

D O I：

10.1007/BF00617565

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The difference between surface roughness amplification and dendritic growth in copper electrodeposition in the limiting current density range is shown. The critical overpotential of copper dendrite growth is determined as 550 mV. © 1979 Chapman and Hall Ltd.

引用

页码：527 / 531

页数：5

共 7 条

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[2] ATANASIU J, 1957, CHEM ABSTR 13470 H, V52
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BOCKRIS, JO
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[4] DESPIC AR, 1970, CROAT CHEM ACTA, V42, P265
[5] DESPIC AR, 1972, MODERN ASPECTS ELECT, V7
[6] MECHANISM OF DENDRITIC ELECTROCRYSTALLIZATION OF ZINC
DIGGLE, JW
DESPIC, AR
BOCKRIS, JO
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (11) : 1503 - &
[7] IBL N, 1962, ADV ELECTROCHEMISTRY, V2

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