ANALYSIS OF DEFECTS IN WEAKLY DAMAGED GAAS BY MONTE-CARLO CHANNELING SIMULATION

被引:8
作者
DYGO, A [1 ]
KACZANOWSKI, J [1 ]
TUROS, A [1 ]
WESCH, W [1 ]
GARTNER, K [1 ]
GOTZ, G [1 ]
机构
[1] UNIV JENA,O-6900 JENA,GERMANY
关键词
D O I
10.1016/0168-583X(92)95565-9
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Channeling spectra measured at 125 and 295 K for <100> GaAs single crystals implanted with low dose N ions were analyzed by two methods: analytical dechanneling theory and Monte Carlo computer simulation. From the temperature dependence of dechanneling it was found that the defect structure consists of atoms statically displaced by a given distance from their lattice site position. The role of thermal vibrations of displaced atoms was also discussed.
引用
收藏
页码:721 / 723
页数:3
相关论文
共 8 条
[1]   MONTE CARLO CHANNELING CALCULATIONS [J].
BARRETT, JH .
PHYSICAL REVIEW B, 1971, 3 (05) :1527-&
[2]   SURFACE STUDIES OF A(III)B(V) COMPOUND SEMICONDUCTORS BY ION CHANNELING [J].
DYGO, A ;
TUROS, A .
PHYSICAL REVIEW B, 1989, 40 (11) :7704-7713
[3]  
Gotz G., 1988, HIGH ENERGY ION BEAM
[4]   ANALYTIC INDEPENDENT-PARTICLE MODEL FOR ATOMS [J].
GREEN, AES ;
SELLIN, DL ;
ZACHOR, AS .
PHYSICAL REVIEW, 1969, 184 (01) :1-&
[5]  
LINDHARD J, 1965, K DAN VIDENSK SELSK, V34
[6]   DEFECTS IN WEAKLY DAMAGED ION-IMPLANTED GAAS AND OTHER III-V SEMICONDUCTORS [J].
WENDLER, E ;
WESCH, W ;
GOTZ, G .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1989, 112 (01) :289-299
[7]   INVESTIGATION OF DEFECTS IN WEAKLY DAMAGED ION-IMPLANTED GAAS-LAYERS [J].
WESCH, W ;
JORDANOV, A ;
GARTNER, K ;
GOTZ, G .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 39 (1-4) :445-448
[8]  
Ziegler J. F., 1985, STOPPING RANGE IONS