TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .1. ION-SOURCE TECHNOLOGY

被引：233

作者：

KAUFMAN, HR ^{[1
]}

CUOMO, JJ ^{[1
]}

HARPER, JME ^{[1
]}

机构：

[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 03期

关键词：

D O I：

10.1116/1.571819

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：725 / 736

页数：12

共 56 条

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