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THERMODYNAMIC EQUILIBRIA IN THE SI-H-CL AND SI-H-BR SYSTEMS
被引:13
作者
:
HUNT, LP
论文数:
0
引用数:
0
h-index:
0
机构:
HUNT ASSOCIATES,BRIDGEWATER,NJ 08807
HUNT ASSOCIATES,BRIDGEWATER,NJ 08807
HUNT, LP
[
1
]
机构
:
[1]
HUNT ASSOCIATES,BRIDGEWATER,NJ 08807
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1988年
/ 135卷
/ 01期
关键词
:
D O I
:
10.1149/1.2095555
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:206 / 209
页数:4
相关论文
共 23 条
[1]
THERMODYNAMICS OF THE SILICON-CHLORINE-HYDROGEN SYSTEM - CHEMICAL-POTENTIAL FOR HOMOGENEOUS NUCLEATION
[J].
ALLEN, KD
论文数:
0
引用数:
0
h-index:
0
ALLEN, KD
;
SAWIN, HH
论文数:
0
引用数:
0
h-index:
0
SAWIN, HH
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1986,
133
(02)
:421
-425
[2]
CHEMICAL PROCESSES IN VAPOR-DEPOSITION OF SILICON .1. DEPOSITION FROM SICL2H2 AND ETCHING BY HCL
[J].
BAN, VS
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
BAN, VS
;
GILBERT, SL
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
GILBERT, SL
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(10)
:1382
-1388
[3]
NOTES ON RAPID COMPUTATION OF CHEMICAL EQUILIBRIA
[J].
CRUISE, DR
论文数:
0
引用数:
0
h-index:
0
CRUISE, DR
.
JOURNAL OF PHYSICAL CHEMISTRY,
1964,
68
(12)
:3797
-&
[4]
LOW-PRESSURE CHEMICAL ETCHING OF SILICON BY HCI/H2 GAS-MIXTURES
[J].
DOMINGUEZ, C
论文数:
0
引用数:
0
h-index:
0
机构:
CSIC,UEI MICROELECTR,E-28006 MADRID,SPAIN
CSIC,UEI MICROELECTR,E-28006 MADRID,SPAIN
DOMINGUEZ, C
;
PASTOR, G
论文数:
0
引用数:
0
h-index:
0
机构:
CSIC,UEI MICROELECTR,E-28006 MADRID,SPAIN
CSIC,UEI MICROELECTR,E-28006 MADRID,SPAIN
PASTOR, G
;
DOMINGUEZ, E
论文数:
0
引用数:
0
h-index:
0
机构:
CSIC,UEI MICROELECTR,E-28006 MADRID,SPAIN
CSIC,UEI MICROELECTR,E-28006 MADRID,SPAIN
DOMINGUEZ, E
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1987,
134
(01)
:199
-202
[5]
ENTHALPIES OF FORMATION OF THE SILANE CHLORIDES
[J].
FARBER, M
论文数:
0
引用数:
0
h-index:
0
机构:
Space Sciences Inc., Monrovia
FARBER, M
;
SRIVASTAVA, RD
论文数:
0
引用数:
0
h-index:
0
机构:
Space Sciences Inc., Monrovia
SRIVASTAVA, RD
.
JOURNAL OF CHEMICAL THERMODYNAMICS,
1979,
11
(10)
:939
-944
[6]
HALL EH, 1968, COMMUNICATION
[7]
EQUILIBRIUM CALCULATIONS FOR THE SI-H-CL SYSTEM FROM 300-K TO 3000-K
[J].
HERRICK, CS
论文数:
0
引用数:
0
h-index:
0
HERRICK, CS
;
SANCHEZMARTINEZ, RA
论文数:
0
引用数:
0
h-index:
0
SANCHEZMARTINEZ, RA
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1984,
131
(02)
:455
-458
[8]
THOROUGH THERMODYNAMIC EVALUATION OF SILICON-HYDROGEN-CHLORINE SYSTEM
[J].
HUNT, LP
论文数:
0
引用数:
0
h-index:
0
HUNT, LP
;
SIRTL, E
论文数:
0
引用数:
0
h-index:
0
SIRTL, E
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1972,
119
(12)
:1741
-&
[9]
EQUILIBRIUM BEHAVIOR OF SILICON-HYDROGEN-BROMINE AND SILICON-HYDROGEN-IODINE SYSTEMS
[J].
HUNT, LP
论文数:
0
引用数:
0
h-index:
0
机构:
DOW CORNING CORP,HEMLOCK,MI 48626
DOW CORNING CORP,HEMLOCK,MI 48626
HUNT, LP
;
SIRTL, E
论文数:
0
引用数:
0
h-index:
0
机构:
DOW CORNING CORP,HEMLOCK,MI 48626
DOW CORNING CORP,HEMLOCK,MI 48626
SIRTL, E
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1973,
120
(06)
:806
-811
[10]
KINETICS OF THE HYDROGENATION OF SILICON TETRACHLORIDE
[J].
INGLE, WM
论文数:
0
引用数:
0
h-index:
0
INGLE, WM
;
PEFFLEY, MS
论文数:
0
引用数:
0
h-index:
0
PEFFLEY, MS
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1985,
132
(05)
:1236
-1240
←
1
2
3
→
共 23 条
[1]
THERMODYNAMICS OF THE SILICON-CHLORINE-HYDROGEN SYSTEM - CHEMICAL-POTENTIAL FOR HOMOGENEOUS NUCLEATION
[J].
ALLEN, KD
论文数:
0
引用数:
0
h-index:
0
ALLEN, KD
;
SAWIN, HH
论文数:
0
引用数:
0
h-index:
0
SAWIN, HH
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1986,
133
(02)
:421
-425
[2]
CHEMICAL PROCESSES IN VAPOR-DEPOSITION OF SILICON .1. DEPOSITION FROM SICL2H2 AND ETCHING BY HCL
[J].
BAN, VS
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
BAN, VS
;
GILBERT, SL
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
GILBERT, SL
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(10)
:1382
-1388
[3]
NOTES ON RAPID COMPUTATION OF CHEMICAL EQUILIBRIA
[J].
CRUISE, DR
论文数:
0
引用数:
0
h-index:
0
CRUISE, DR
.
JOURNAL OF PHYSICAL CHEMISTRY,
1964,
68
(12)
:3797
-&
[4]
LOW-PRESSURE CHEMICAL ETCHING OF SILICON BY HCI/H2 GAS-MIXTURES
[J].
DOMINGUEZ, C
论文数:
0
引用数:
0
h-index:
0
机构:
CSIC,UEI MICROELECTR,E-28006 MADRID,SPAIN
CSIC,UEI MICROELECTR,E-28006 MADRID,SPAIN
DOMINGUEZ, C
;
PASTOR, G
论文数:
0
引用数:
0
h-index:
0
机构:
CSIC,UEI MICROELECTR,E-28006 MADRID,SPAIN
CSIC,UEI MICROELECTR,E-28006 MADRID,SPAIN
PASTOR, G
;
DOMINGUEZ, E
论文数:
0
引用数:
0
h-index:
0
机构:
CSIC,UEI MICROELECTR,E-28006 MADRID,SPAIN
CSIC,UEI MICROELECTR,E-28006 MADRID,SPAIN
DOMINGUEZ, E
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1987,
134
(01)
:199
-202
[5]
ENTHALPIES OF FORMATION OF THE SILANE CHLORIDES
[J].
FARBER, M
论文数:
0
引用数:
0
h-index:
0
机构:
Space Sciences Inc., Monrovia
FARBER, M
;
SRIVASTAVA, RD
论文数:
0
引用数:
0
h-index:
0
机构:
Space Sciences Inc., Monrovia
SRIVASTAVA, RD
.
JOURNAL OF CHEMICAL THERMODYNAMICS,
1979,
11
(10)
:939
-944
[6]
HALL EH, 1968, COMMUNICATION
[7]
EQUILIBRIUM CALCULATIONS FOR THE SI-H-CL SYSTEM FROM 300-K TO 3000-K
[J].
HERRICK, CS
论文数:
0
引用数:
0
h-index:
0
HERRICK, CS
;
SANCHEZMARTINEZ, RA
论文数:
0
引用数:
0
h-index:
0
SANCHEZMARTINEZ, RA
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1984,
131
(02)
:455
-458
[8]
THOROUGH THERMODYNAMIC EVALUATION OF SILICON-HYDROGEN-CHLORINE SYSTEM
[J].
HUNT, LP
论文数:
0
引用数:
0
h-index:
0
HUNT, LP
;
SIRTL, E
论文数:
0
引用数:
0
h-index:
0
SIRTL, E
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1972,
119
(12)
:1741
-&
[9]
EQUILIBRIUM BEHAVIOR OF SILICON-HYDROGEN-BROMINE AND SILICON-HYDROGEN-IODINE SYSTEMS
[J].
HUNT, LP
论文数:
0
引用数:
0
h-index:
0
机构:
DOW CORNING CORP,HEMLOCK,MI 48626
DOW CORNING CORP,HEMLOCK,MI 48626
HUNT, LP
;
SIRTL, E
论文数:
0
引用数:
0
h-index:
0
机构:
DOW CORNING CORP,HEMLOCK,MI 48626
DOW CORNING CORP,HEMLOCK,MI 48626
SIRTL, E
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1973,
120
(06)
:806
-811
[10]
KINETICS OF THE HYDROGENATION OF SILICON TETRACHLORIDE
[J].
INGLE, WM
论文数:
0
引用数:
0
h-index:
0
INGLE, WM
;
PEFFLEY, MS
论文数:
0
引用数:
0
h-index:
0
PEFFLEY, MS
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1985,
132
(05)
:1236
-1240
←
1
2
3
→