MOCVD GROWTH OF CUINSE2 - 1ST RESULTS

被引:20
作者
SAGNES, B
SALESSE, A
ARTAUD, MC
DUCHEMIN, S
BOUGNOT, J
BOUGNOT, G
机构
[1] Centre d'Electronique de Montpellier (URA 391 du CNRS), Université Montpellier II Sciences et Techniques de Languedoc., F-34095 Montpellier Cédex 05, Place E. Bataillon
关键词
D O I
10.1016/0022-0248(92)90527-P
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
In this paper, we present the different ways by which we tried to grow CuInSe2 (CIS) films in order to work at relatively low source temperature (< 80-degrees-C), with an acceptable vapor pressure and without oxygen in the layer, in the aim to realize homojunction solar cells. Some characterizations achieved on the different compounds obtained, and some studies on the copper deposition from (hfa)2Cu complexed with trimethylamine are also investigated.
引用
收藏
页码:620 / 627
页数:8
相关论文
共 20 条
[1]   LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION OF HIGH-PURITY COPPER FROM AN ORGANOMETALLIC SOURCE [J].
BEACH, DB ;
LEGOUES, FK ;
HU, CK .
CHEMISTRY OF MATERIALS, 1990, 2 (03) :216-219
[2]   FORMATION OF HIGH-TC SUPERCONDUCTING FILMS BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION [J].
BERRY, AD ;
GASKILL, DK ;
HOLM, RT ;
CUKAUSKAS, EJ ;
KAPLAN, R ;
HENRY, RL .
APPLIED PHYSICS LETTERS, 1988, 52 (20) :1743-1745
[3]   SOLUTION GROWTH AND ELECTRODEPOSITED CULNSE2 THIN-FILMS [J].
BHATTACHARYA, RN .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (10) :2040-2042
[4]  
DIMMLER A, 20TH IEEE PHOT SPEC
[5]  
DUCHEMIN S, 1988, EUROFORM NEW ENERGIE, V3, P205
[6]  
DUCHEMIN S, 1989, 9TH P EUR COMM PHOT, P476
[7]   EPITAXIAL-GROWTH OF CUGAS2 BY METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].
HARA, K ;
KOJIMA, T ;
KUKIMOTO, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1987, 26 (07) :L1107-L1109
[8]   MOVPE GROWTH AND CHARACTERIZATION OF I-III-VI2 CHALCOPYRITE COMPOUNDS [J].
HARA, K ;
SHINOZAWA, T ;
YOSHINO, J ;
KUKIMOTO, H .
JOURNAL OF CRYSTAL GROWTH, 1988, 93 (1-4) :771-775
[9]   LOW-TEMPERATURE METAL-ORGANIC CHEMICAL VAPOR-DEPOSITION (LTMOCVD) OF DEVICE-QUALITY COPPER-FILMS FOR MICROELECTRONIC APPLICATIONS [J].
KALOYEROS, AE ;
FENG, A ;
GARHART, J ;
BROOKS, KC ;
GHOSH, SK ;
SAXENA, AN ;
LUEHRS, F .
JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (03) :271-276
[10]  
LECOHIER B, 1991, J PHYSIQUE, V4, P279