PROPERTIES OF RF SPUTTERED HYDROGENATED AMORPHOUS GERMANIUM-SILICON ALLOYS

被引：18

作者：

BANERJEE, PK ^{[1
]}

DUTTA, R ^{[1
]}

MITRA, SS ^{[1
]}

PAUL, DK ^{[1
]}

机构：

[1] HARVARD UNIV,GORDON MCKAY LAB,CAMBRIDGE,MA 02138

来源：

关键词：

D O I：

10.1016/0022-3093(82)90194-6

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1 / 11

页数：11

共 21 条

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