FINE FOCUSED ION-BEAMS

被引：31

作者：

SELIGER, RL

KUBENA, RL

WANG, V

机构：

来源：

关键词：

D O I：

10.7567/JJAPS.21S1.3

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3 / 10

页数：8

共 9 条

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[2]

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[4] HIGH-CURRENT DENSITY GA+ IMPLANTATIONS INTO SI [J].

HART, RR ;

ANDERSON, CL ;

DUNLAP, HL ;

SELIGER, RL ;

WANG, V .

[5]

MOFFETT WG, 1977, HDB BINARY PHASE DIA

[6] HIGH-INTENSITY SCANNING ION PROBE WITH SUBMICROMETER SPOT SIZE [J].

SELIGER, RL ;

WARD, JW ;

WANG, V ;

KUBENA, RL .

[7]

van Der Pauw L. J., 1958, PHILIPS RES REP, V13, P1

[8]

WANG V, 1980, 9TH INT C EL ION BEA

[9]

WYSOCKI JA, 1979, COMMUNICATION