LOW-TEMPERATURE RESISTIVITY OF SILVER

被引:36
作者
KHOSHNEVISAN, M [1 ]
PRATT, WP [1 ]
SCHROEDER, PA [1 ]
STEENWYK, S [1 ]
UHER, C [1 ]
机构
[1] MICHIGAN STATE UNIV,E LANSING,MI 48824
来源
JOURNAL OF PHYSICS F-METAL PHYSICS | 1979年 / 9卷 / 01期
关键词
D O I
10.1088/0305-4608/9/1/001
中图分类号
O59 [应用物理学];
学科分类号
摘要
The resistivity rho has been measured between 0.04 and 7K for 'pure' polycrystalline ingots of silver, in a dilution refrigerator with a SQUID null detector system. The measurements confirm the existence of a substantial temperature range where rho - rho 0 varies as T4. At the lowest temperatures rho - rho 0 varies as T2.19, which strongly suggests that an electron-electron scattering T2 regime may be reached using a higher-precision measuring technique.
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页码:L1 / L5
页数:5
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