SYNTHESIS AND CHARACTERIZATION OF SILICON-NITRIDE WHISKERS

被引:105
作者
WANG, MJ
WADA, HR
机构
[1] Department of Materials Science and Engineering, The University of Michigan, Ann Arbor, 48109, Michigan
关键词
D O I
10.1007/BF01045372
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Silicon nitride whiskers were synthesized by the carbothermal reduction of silica under nitrogen gas flow. The formation of silicon nitride whiskers occurs through a gas-phase reaction, 3SiO(g)+3CO(g)+2N2(g)=Si3N4(β)+3CO2(g), and the VS mechanism. The generation of SiO gas was enhanced by the application of a halide bath. Various nitrogen flow rates resulted in different whisker yields and morphologies. A suitable gas composition range of N2, SiO and O2 is necessary to make silicon nitride stable and grow in a whisker form. The oxygen partial pressure of the gas phase was measured by an oxygen sensor and the gas phase was analysed for CO/CO2 by gas chromatography. Silicon nitride was first formed as a granule, typically a polycrystalline, and then grown as a single crystal whisker from the {1 0 0} plane of the granule along the 〈 210 〉 direction. The whiskers were identified as β′-sialon with Z value ranging from 0.8 to 1.1, determined by lattice parameter measurements. © 1990 Chapman and Hall Ltd.
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页码:1690 / 1698
页数:9
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