RESISTIVITY MEASUREMENT OF THIN SEMICONDUCTOR-FILMS ON METALLIC SUBSTRATES

被引：4

作者：

HOGAN, S ^{[1
]}

WAGNER, S ^{[1
]}

BARNES, FS ^{[1
]}

机构：

[1] UNIV COLORADO,DEPT ELECT ENGN,BOULDER,CO 80309

来源：

APPLIED PHYSICS LETTERS | 1979年 / 35卷 / 01期

关键词：

D O I：

10.1063/1.90899

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The resistivity of thin polycrystalline films of cadmium deposited on brass substrates has been measured by a microwave technique. The samples, of the type employed in solar-cell research, form the plane reflector of a semiconfocal Fabry-Perot millimeter-wave interferometer. The resistivity is derived by field-pertubation analysis as a simple function of the quality factors for the cavity with and without the semiconductor layer, respectively. Results are in excellent agreement with those of current-voltage measurements on samples with metallic contacts.

引用

页码：77 / 78

页数：2

共 7 条

[1] CONFOCAL MULTIMODE RESONATOR FOR MILLIMETER THROUGH OPTICAL WAVELENGTH MASERS [J].