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OPTICAL MANIPULATION OF RESIST PROFILE IN CONFORMABLE PRINTING
被引:5
作者
:
LIN, BJ
论文数:
0
引用数:
0
h-index:
0
LIN, BJ
机构
:
来源
:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY
|
1978年
/ 15卷
/ 03期
关键词
:
D O I
:
10.1116/1.569725
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:1012 / 1015
页数:4
相关论文
共 4 条
[1]
DIFFRACTION OF ELECTROMAGNETIC-WAVES BY A SEMI-INFINITE SCREEN IN A LAYERED MEDIUM
HEITMAN, WG
论文数:
0
引用数:
0
h-index:
0
机构:
DELFT UNIV TECHNOL,DEPT ELECT ENGN,DIV ELECTROMAGNETIC RES,DELFT,NETHERLANDS
DELFT UNIV TECHNOL,DEPT ELECT ENGN,DIV ELECTROMAGNETIC RES,DELFT,NETHERLANDS
HEITMAN, WG
VANDENBERG, PM
论文数:
0
引用数:
0
h-index:
0
机构:
DELFT UNIV TECHNOL,DEPT ELECT ENGN,DIV ELECTROMAGNETIC RES,DELFT,NETHERLANDS
DELFT UNIV TECHNOL,DEPT ELECT ENGN,DIV ELECTROMAGNETIC RES,DELFT,NETHERLANDS
VANDENBERG, PM
[J].
CANADIAN JOURNAL OF PHYSICS,
1975,
53
(14)
: 1305
-
1317
[2]
JEWETT RE, 1976, 4TH TECH C PHOT ELL
[3]
DEEP UV LITHOGRAPHY
LIN, BJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
LIN, BJ
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1975,
12
(06):
: 1317
-
1320
[4]
PROPER EQUALITY CONSTRAINTS AND MAXIMIZATION OF INDEX VECTORS
LIN, JG
论文数:
0
引用数:
0
h-index:
0
机构:
COLUMBIA UNIV,DEPT ELECT ENGN & COMP SCI,NEW YORK,NY 10027
COLUMBIA UNIV,DEPT ELECT ENGN & COMP SCI,NEW YORK,NY 10027
LIN, JG
[J].
JOURNAL OF OPTIMIZATION THEORY AND APPLICATIONS,
1976,
20
(02)
: 215
-
244
←
1
→
共 4 条
[1]
DIFFRACTION OF ELECTROMAGNETIC-WAVES BY A SEMI-INFINITE SCREEN IN A LAYERED MEDIUM
HEITMAN, WG
论文数:
0
引用数:
0
h-index:
0
机构:
DELFT UNIV TECHNOL,DEPT ELECT ENGN,DIV ELECTROMAGNETIC RES,DELFT,NETHERLANDS
DELFT UNIV TECHNOL,DEPT ELECT ENGN,DIV ELECTROMAGNETIC RES,DELFT,NETHERLANDS
HEITMAN, WG
VANDENBERG, PM
论文数:
0
引用数:
0
h-index:
0
机构:
DELFT UNIV TECHNOL,DEPT ELECT ENGN,DIV ELECTROMAGNETIC RES,DELFT,NETHERLANDS
DELFT UNIV TECHNOL,DEPT ELECT ENGN,DIV ELECTROMAGNETIC RES,DELFT,NETHERLANDS
VANDENBERG, PM
[J].
CANADIAN JOURNAL OF PHYSICS,
1975,
53
(14)
: 1305
-
1317
[2]
JEWETT RE, 1976, 4TH TECH C PHOT ELL
[3]
DEEP UV LITHOGRAPHY
LIN, BJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
LIN, BJ
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1975,
12
(06):
: 1317
-
1320
[4]
PROPER EQUALITY CONSTRAINTS AND MAXIMIZATION OF INDEX VECTORS
LIN, JG
论文数:
0
引用数:
0
h-index:
0
机构:
COLUMBIA UNIV,DEPT ELECT ENGN & COMP SCI,NEW YORK,NY 10027
COLUMBIA UNIV,DEPT ELECT ENGN & COMP SCI,NEW YORK,NY 10027
LIN, JG
[J].
JOURNAL OF OPTIMIZATION THEORY AND APPLICATIONS,
1976,
20
(02)
: 215
-
244
←
1
→