CRYSTAL-STRUCTURE AND MAGNETIC-PROPERTIES OF MN-AL-NI FILMS PREPARED BY SPUTTERING

被引：11

作者：

MORISAKO, A ^{[1
]}

KOHSHIRO, N ^{[1
]}

MATSUMOTO, M ^{[1
]}

NAOE, M ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,FAC PHYS,TOKYO 152,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1990年 / 67卷 / 09期

关键词：

D O I：

10.1063/1.346106

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Mn60-xAl40Nix ternary alloy films were prepared by dc magnetron sputtering, and their crystallographic characteristics and magnetic properties have been investigated. The τ and κ phases were synthesized at a Ni content of below 7 at. % and above 10 at. %, respectively, and the mixture of both phases were synthesized at a Ni content of about 7.9 at. %. The lattice constant a of tetragonal structure in the films increased from 3.98 to 4.12 Å, and c decreased from 3.48 to 3.21 Å with the increase of Ni content. The Ms for the τ phase increased from 120 to 240 emu/cc by a few percent Ni substitution. Mn-Al-Ni films with single τ phase showed anisotropic characteristics in the magnetization curve due to the preferential orientation of the c axis for tetragonal crystallite.

引用

页码：5655 / 5657

页数：3

共 7 条

[1]

KOCH AJJ, 1960, J APPL PHYS, V31, P75

[2]

KONO H, 1958, J PHYS SOC JPN, V13, P1444

[3] SPUTTERED MN-AL-CU FILMS FOR MAGNETIC RECORDING MEDIA [J].