MEASUREMENTS OF THE REFRACTIVE-INDEX VARIATIONS WITH TEMPERATURE OF A PHOTOMONOMER

被引：8

作者：

ANDERSON, RE

LIGHTMAN, AJ

机构：

[1] Development Laboratory, University of Dayton, Dayton, OH, 45469-0140

来源：

APPLIED OPTICS | 1991年 / 30卷 / 27期

关键词：

STEREOLITHOGRAPHY; PHOTOMONOMER; INDEX OF REFRACTION;

D O I：

10.1364/AO.30.003792

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The temperature dependence of the index of refraction of CIBATOOL XB5081, a commercial photomonomer commonly used for stereolithographic part building, is measured at wavelengths of 632.8, 514.5, and 488.0 nm.

引用

页码：3792 / 3793

页数：2