CATIONIC TBP SILICON - A STABLE INTERMEDIATE IN THE PROTON-ASSISTED DEPARTURE OF AN EQUATORIAL SUBSTITUENT

被引：23

作者：

WONING, J ^{[1
]}

DANIELS, LM ^{[1
]}

VERKADE, JG ^{[1
]}

机构：

[1] IOWA STATE UNIV SCI & TECHNOL,DEPT CHEM,GILMAN HALL,AMES,IA 50011

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1990年 / 112卷 / 11期

关键词：

D O I：

10.1021/ja00167a100

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：4601 / 4602

页数：2

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