PRESSURE-DEPENDENCE OF THE METAL-SEMICONDUCTOR TRANSITION IN TAS3

被引:40
作者
IDO, M
TSUTSUMI, K
SAMBONGI, T
MORI, N
机构
[1] Department of Physics, Hokkaido University, Sapporo
关键词
D O I
10.1016/0038-1098(79)90580-5
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
TaS3 exhibits the metal-semiconductor transition at 218 K due to the Peierls instability. The electrical resistance was measured under pressure. It was found that both the transition temperature, Tp, and the activation energy at T=0 K, △(0), decrease with pressure at the rates of dTp dP {reversed tilde equals}-1.3 K kbar and d△(0) dP{reversed tilde equals}-4 K kbar, respectively, while the ratio, △ (0) Tp, is independent of pressure. © 1979.
引用
收藏
页码:399 / 402
页数:4
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