X-RAY STEPPER EXPOSURE SYSTEM PERFORMANCE AND STATUS

被引：9

作者：

FLAMHOLZ, A

RIPPSTEIN, R

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 06期

关键词：

D O I：

10.1116/1.584891

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An integrated x-ray align and expose system has been installed at Brookhaven National Laboratory National Synchrotron Light Source VUV beam line U2. The system includes the first commercially available x-ray align and expose system, the Karl Suss XRS-200 and matched beamline. Subsystem and aligned exposure tests were performed to characterize the entire system. Initial results are presented for key lithographic properties as well as throughput. Improvements and future activities are also described.

引用

页码：2002 / 2007

页数：6

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