AES AND XPS STUDIES OF NO ADSORPTION ON AL(100) SINGLE-CRYSTAL

被引：13

作者：

HOFFMAN, A ^{[1
]}

MANIV, T ^{[1
]}

FOLMAN, M ^{[1
]}

机构：

[1] TECHNION ISRAEL INST TECHNOL,INST SOLID STATE,IL-32000 HAIFA,ISRAEL

来源：

SURFACE SCIENCE | 1987年 / 183卷 / 03期

关键词：

D O I：

10.1016/S0039-6028(87)80223-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：484 / 502

页数：19

共 9 条

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[2]

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[3]

EGELHOFF WF, 1985, CHEM PHYSICS SOLID S, V4

[4] AUGER AND XP SPECTRA OF OXYGEN ADSORBED ON AL(100), RELAXATION ENERGIES AND THE NATURE OF THE ADSORBED LAYER [J].

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MANIV, T ;

FOLMAN, M .

SURFACE SCIENCE, 1987, 182 (1-2) :56-68

[5]

LAMBERT RM, 1985, CHEM PHYSICS SOLID S, V3

[6] FORMATION OF AL-NITRIDE FILMS AT ROOM-TEMPERATURE BY NITROGEN ION-IMPLANTATION INTO ALUMINUM [J].

LIESKE, N ;

HEZEL, R .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (09) :5806-5810

[7]

PAULINGS L, 1960, NATURE CHEM BOND

[8] XPS AND AES STUDY OF ADSORPTION AND DESORPTION OF NO ON W(100) [J].

PELACH, E ;

VITURRO, RE ;

FOLMAN, M .

SURFACE SCIENCE, 1985, 161 (2-3) :553-566

[9]

WEISSMANN R, 1979, SOLID STATE COMMUN, V31, P347, DOI 10.1016/0038-1098(79)90553-2

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