MAGNETIC-PROPERTIES OF FE-TA-N-O FILM WITH HIGH SATURATION FLUX-DENSITY

被引：21

作者：

WATANABE, Y

OURA, H

ONOZATO, N

机构：

[1] Central R&D Center JVC, Kanagawa 239

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1990年 / 26卷 / 05期

关键词：

D O I：

10.1109/20.104429

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper reports the magnetic properties and the microstructure of Fe-Ta-N-O film prepared by the facing targets sputtering method. The addition of a small amount of Ta to Fe-N-O improves the thermal stability of magnetic properties at 600°C without a decrease of saturation flux density The microcrystalied state of Fe-Ta-N-O fi1m examined by X-ray diffractometer is related to the good soft magnetic properties. © 1990 IEEE

引用

页码：1500 / 1502

页数：3