LOCAL PEELING OF PHOTORESIST FILM DURING ULTRAVIOLET-LIGHT EXPOSURE

被引：2

作者：

KAWAI, A ^{[1
]}

NAGATA, H ^{[1
]}

MORIMOTO, H ^{[1
]}

TAKATA, M ^{[1
]}

机构：

[1] MITSUBISHI ELECTR CORP,ULSI LAB,ITAMI,HYOGO 664,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1994年 / 33卷 / 1B期

关键词：

ADHESION; SURFACE FREE ENERGY; PEEL; PHOTORESIST; LSI; DEFECT; STRAIN; INORGANIC SUBSTRATE;

D O I：

10.1143/JJAP.33.L149

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Circular peels are formed during exposure of the photoresist film to ultraviolet (UV) light. Dependency of peel formation in photoresist film on adhesion energy is investigated. The value of adhesion energy is derived from the measurement value of surface free energy. The surface free energy of inorganic substrates used for the investigation is between the values of 46.5 and 62.6 dyn/cm. It is found that the number of peels decreases as the adhesion energy increases. Peel formation can be explained by using the adhesion energy.

引用

页码：L149 / L151

页数：3

共 9 条

[1] THE STRUCTURE OF FILMS OF SILANE PRIMERS ON ALUMINUM SUBSTRATES [J].