USE OF RUTHERFORD BACKSCATTERING TO STUDY BEHAVIOR OF ION-IMPLANTED ATOMS DURING ANODIC-OXIDATION OF ALUMINUM - AR, KR, XE, K, RB, CS, CL, BR, AND I

被引：238

作者：

BROWN, F ^{[1
]}

MACKINTOSH, WD ^{[1
]}

机构：

[1] ATOM ENERGY CANADA LTD, NUCL LABS, CHALK RIVER, ONTARIO, CANADA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 08期

关键词：

D O I：

10.1149/1.2403637

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1096 / 1102

页数：7

共 19 条

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[9]

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[10] A NEW METHOD FOR MEASURING DEPTHS OF EMBEDDED RADIOTRACER ATOMS USING A PRECISION BETA-RAY SPECTROMETER [J].

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