THERMAL-STABILITY OF NI-C MULTILAYER MIRROR FOR X-RAYS

被引：13

作者：

NAKAJIMA, K ^{[1
]}

AOKI, S ^{[1
]}

SUDO, S ^{[1
]}

FUJIWARA, S ^{[1
]}

机构：

[1] UNIV TSUKUBA,INST APPL PHYS,TSUKUBA,IBARAKI 305,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1992年 / 31卷 / 9A期

关键词：

MULTILAYER MIRROR; NICKEL CARBON; THERMAL STABILITY; X-RAY REFLECTIVITY; INTERDIFFUSION; LAYER STRUCTURE; CRYSTAL STRUCTURE; X-RAY DIFFRACTION; TRANSMISSION ELECTRON MICROSCOPY; AUGER ELECTRON SPECTROSCOPY;

D O I：

10.1143/JJAP.31.2864

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The measurement of X-ray reflectivity has been performed with the lapse of annealing time for heat treatment up to 400-degrees-C in order to investigate the thermal stability of a nickel-carbon multilayer mirror for X-rays. The microstructural change of a multilayer film has been examined by means of X-ray diffraction, Auger electron spectroscopy and electron microscopy. The results show that the crystallization of nickel and the formation of nickel carbide occur for annealing above 300-degrees-C. As a consequence of microstructural changes, the surface and interfaces become rough, layer structure is destroyed, and the X-ray reflectivity shows a definite decrease.

引用

页码：2864 / 2868

页数：5

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