MOSSBAUER AND ANODIC-OXIDATION STUDY OF CO-IMPLANTED SI

被引：5

作者：

DEPOTTER, M

LANGOUCHE, G

DEBRUYN, J

VANROSSUM, M

COUSSEMENT, R

DEZSI, I

机构：

来源：

HYPERFINE INTERACTIONS | 1981年 / 10卷 / 1-4期

关键词：

D O I：

10.1007/BF01022008

中图分类号：

O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];

学科分类号：

070203 ; 070304 ; 081704 ; 1406 ;

摘要：

引用

页码：769 / 774

页数：6

共 10 条

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BERGHOLZ, W ;

SCHROTER, W .

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[2]

DAMGAARD S, 1980, J PHYS-PARIS, V41, P427

[3]

DEZSI I, 1980, J PHYS-PARIS, V41, P425

[4] OBSERVATION OF A STRONG DOSE DEPENDENCE IN CO-57 IMPLANTATIONS IN SI AND GE [J].

LANGOUCHE, G ;

DEZSI, I ;

VANROSSUM, M ;

DEBRUYN, J ;

COUSSEMENT, R .

PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1979, 93 (02) :K107-K110

[5] EXISTENCE OF A QUADRUPOLE INTERACTION AT FE-57 IMPLANTED IN SI AND GE [J].

LANGOUCHE, G ;

DEZSI, I ;

VANROSSUM, M ;

DEBRUYN, J ;

COUSSEMENT, R .

PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1978, 89 (01) :K17-K19

[6]

LANGOUCHE G, 1980, J PHYS-PARIS, V41, P421

[7]

Latshaw G. L., 1971, THESIS STANFORD U

[8]

SAWICKA BD, 1976, J PHYSIQUE, V37, P879

[9] MOSSBAUER STUDY OF HEAT-TREATED FE-57 IMPLANTED SILICON [J].

SAWICKI, J ;

SAWICKA, B ;

STANEK, J ;

KOWALSKI, J .

PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1976, 77 (01) :K1-K4

[10]

WEYER G, 1976, J PHYSIQUE, V37, P893

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