SOLID-STATE REACTIONS OF THE AG-CU-TI THIN-FILM AL2O3 SUBSTRATE SYSTEM

被引:11
作者
SUENAGA, S
KOYAMA, M
ARAI, S
NAKAHASHI, M
机构
[1] Materials and Devices Laboratories, Research and Development Center, Toshiba Corporation
关键词
D O I
10.1557/JMR.1993.1805
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A new interpretation of the reaction mechanism between active metal thin-film filler and ceramic substrate is proposed. The authors predict the possibility of prebonding reactions, prior to melting of the filler, at the interface of the system described above. To prove this, solid-state reactions of Ag-Cu-Ti thin films on sapphire substrates have been studied with Auger electron spectroscopy (AES) and x-ray diffraction (XRD). Reaction process and products have been clarified at the temperature just below the melting point of the filler. It is evident that Cu3Ti3O (diamond structure of Fd3m) is formed by the reaction between Cu3Ti and 0 which results from the reduction of sapphire. It seems that Cu3Ti3O contributes to bonding between metals and sapphire as an intermediate phase.
引用
收藏
页码:1805 / 1811
页数:7
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