INFLUENCE OF CATHODE THICKNESS AND AGING ON PHOTOELECTRIC YIELDS OF LIF AND CSL IN XUV

被引：15

作者：

HEROUX, L

MCMAHON, WJ

HINTEREGGER, HE

机构：

来源：

APPLIED OPTICS | 1966年 / 5卷 / 08期

关键词：

D O I：

10.1364/AO.5.001338

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

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页码：1338 / +

页数：1

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