ANALYSIS OF RF-SPUTTERED TIB2 HARD COATINGS BY MEANS OF X-RAY-DIFFRACTOMETRY AND AUGER-ELECTRON SPECTROSCOPY

被引：47

作者：

LOHMANN, R ^{[1
]}

OSTERSCHULZE, E ^{[1
]}

THOMA, K ^{[1
]}

GARTNER, H ^{[1
]}

HERR, W ^{[1
]}

MATTHES, B ^{[1
]}

BROSZEIT, E ^{[1
]}

KLOOS, KH ^{[1
]}

机构：

[1] TH DARMSTADT,INST WERKSTOFFKUNDE,W-6100 DARMSTADT,GERMANY

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1991年 / 139卷

关键词：

D O I：

10.1016/0921-5093(91)90626-X

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The bias voltage can be a very important parameter in r.f. sputtering. Auger electron spectroscopy (AES) and X-ray diffraction (XRD) were used to investigate the influence of this parameter of TiB2 hard coatings. As a result of the AES measurements the boron-to-titanium ratio depends on the bias voltage. With XRD, significant differences in the various coatings can be observed.

引用

页码：259 / 263

页数：5

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