INSB-BASED MATERIALS FOR DETECTORS

被引:31
作者
STRADLING, RA
机构
[1] Blackett Lab., Imperial Coll., London
关键词
D O I
10.1088/0268-1242/6/12C/011
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The development of new epitaxial techniques has given rise to a variety of novel material combinations. Pseudomorphic combinations where the partners have lattice constants which differ by more than 1 % are currently being extensively studied. The built-in strain can alter the symmetry and magnitudes of the bandgaps concerned. The growth and properties of narrow-gap semiconductor systems are reviewed together with their use as components for strained-layer structures. The materials discussed are InSb, InAs and the alloys of these two compounds. The alloy system InAs(1-x)Sb(x) is prone to metallurgical problems such as ordering and phase separation in the mid-alloy range but high-mobility samples have been grown. Other alloy systems are also affected by similar problems. Spike-doped and n-i-p-i structures are studied in InSb and InAs. Minimal dopant diffusion is found. The control of the material properties achieved has enabled the fabrication of a number of prototype device structures including n-i-p-i photodetectors and resonant interband tunnelling structures with inversion barriers.
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页码:C52 / C58
页数:7
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