PRESSURE EFFECTS ON KINETICS AND DECAY PROCESSES IN XENON AFTER SELECTIVE PHOTOEXCITATION

被引：62

作者：

MOUTARD, P ^{[1
]}

LAPORTE, P ^{[1
]}

SUBTIL, JL ^{[1
]}

DAMANY, N ^{[1
]}

DAMANY, H ^{[1
]}

机构：

[1] UNIV LYON 1, ST ETIENNE, FRANCE

来源：

JOURNAL OF CHEMICAL PHYSICS | 1988年 / 88卷 / 12期

关键词：

D O I：

10.1063/1.454313

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：7485 / 7500

页数：16

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