H-DIFFUSION AND D-DIFFUSION IN NB AND TA IN THE PRESENCE OF N-INTERSTITIAL IMPURITIES

被引：18

作者：

QI, Z ^{[1
]}

VOLKL, J ^{[1
]}

WIPF, H ^{[1
]}

机构：

[1] TECH UNIV MUNICH,DEPT PHYS,D-8046 GARCHING,FED REP GER

来源：

SCRIPTA METALLURGICA | 1982年 / 16卷 / 07期

关键词：

D O I：

10.1016/0036-9748(82)90245-9

中图分类号：

TF [冶金工业];

学科分类号：

0806 [冶金工程];

摘要：

引用

页码：859 / 864

页数：6

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