MULTILEVEL PHASE HOLOGRAMS MANUFACTURED BY ELECTRON-BEAM LITHOGRAPHY

被引：27

作者：

EKBERG, M

LARSSON, M

HARD, S

NILSSON, B

机构：

[1] Applied Electron Physics, Chalmers University of Technology, Göteborg

[2] National Nanometer Laboratory, Chalmers University of Technology, Göteborg

来源：

OPTICS LETTERS | 1990年 / 15卷 / 10期

关键词：

D O I：

10.1364/OL.15.000568

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to our knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to our knowledge, the highest reported to date. © 1990 Optical Society of America.

引用

页码：568 / 569

页数：2

共 7 条

[1]

ANDERSSON H, UNPUB APPL OPT

[2] ELECTRON-BEAM FABRICATION OF COMPUTER-GENERATED HOLOGRAMS [J].