NANOMETER ELECTRODE FABRICATION TECHNOLOGY USING ANODIC-OXIDATION RESIST AND APPLICATION TO UNIDIRECTIONAL SURFACE-ACOUSTIC-WAVE TRANSDUCERS

Nanometer lithography technology is very important for high density integrated circuits and higher-frequency-range surface acoustic wave (SAW) devices. The frequency ranges of SAW devices extend to around 10 GHz; therefore a sub-micron technology below 0.1 mum is required. In this paper. we propose new lithography techniques for nanometer fabrication using very thin anodic oxidation films. Since very thin resists (less than 50 nm) can be used in this process. a narrow resist pattern and electrodes can be obtained. The results show the 75 nm width of an interdigital transducer (IDT) made of aluminum with thickness of 30 nm on 128-degrees Y-X LiNbO3. SAW experimental results show the 17 GHz-range characteristics. Also. new lithography technologies are applied to 2 GHz low-loss filters using a unidirectional transducer.