CORRECTION OF MEAN INNER POTENTIAL IN ELECTRON DIFFRACTION

被引：14

作者：

ICHIKAWA, M

OHTSUKI, YH

机构：

[1] Department of Physics, Waseda University, Tokyo

来源：

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN | 1969年 / 27卷 / 04期

关键词：

D O I：

10.1143/JPSJ.27.953

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The corrections of the mean inner potential, or the scattering factor of 0-th order V0 due to plasmon excitation and phonon excitation are calculated on the basis of the 2nd order perturbation theory. It is shown that the contribution of the plasmon excitation becomes large in low energy electron diffraction. Numerical calculations are performed for Si and Al. © 1969, THE PHYSICAL SOCIETY OF JAPAN. All rights reserved.

引用

页码：953 / &