EFFICIENT HIGH-HOMOGENEOUS WIDE-APERTURE EXCIMER DISCHARGE USING A STABILIZING LOW-CURRENT PREDISCHARGE

被引:15
作者
BYCHKOV, Y [1 ]
KOSTYRYA, I [1 ]
MAKAROV, M [1 ]
SUSLOV, A [1 ]
YASTREMSKY, A [1 ]
机构
[1] RUSSIAN ACAD SCI,INST HIGH CURRENT ELECTR,4 AKADEMICHESKY AVE,TOMSK 634055,RUSSIA
关键词
D O I
10.1063/1.1145236
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A technique of initiation of a self-sustained electrical discharge for pumping excimer lasers, based on the use of a stabilizing predischarge with an electron density N(e) approximately 10(12)-10(13) CM-3 , has been developed. It has been demonstrated that such an auxiliary discharge is stable for random disturbances of the plasma parameters. An efficient, stable, and highly homogeneous pumping discharge of duration up to 800 ns with an aperture of 6 X 12 cm2 and current density of approximately 300 A/cm2 has been realized in Ne(He,Ar)/Xe(Kr)/HCI mixtures. The proposed technique can be used in developing wide-aperture excimer lasers and shows promise for creating high-repetition-rate systems of kilowatt average. power.
引用
收藏
页码:793 / 798
页数:6
相关论文
共 12 条
[1]  
BASTING D, 1988, SPIE, V1023, P268
[2]  
BYCHKOV Y, 1989, SOV J PLASMA PHYS, V15, P330
[3]  
BYCHKOV YI, 1982, KVANTOVAYA ELEKTRON+, V9, P2423
[4]   STABILITY OF TRANSVERSE SELF-SUSTAINED DISCHARGE-EXCITED LONG-PULSE XECL LASERS [J].
COUTTS, J ;
WEBB, CE .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (03) :704-710
[5]  
DEANGELIS A, 1988, APPL PHYS B-PHOTO, V47, P1, DOI 10.1007/BF00696201
[6]  
KUSHNER M, 1991, IEEE T PLASMA SCI, V19, P386
[7]   EFFICIENT DISCHARGE PUMPING OF AN XECL LASER USING A HIGH-VOLTAGE PREPULSE [J].
LONG, WH ;
PLUMMER, MJ ;
STAPPAERTS, EA .
APPLIED PHYSICS LETTERS, 1983, 43 (08) :735-737
[8]  
McKee T. J., 1989, IEEE Photonics Technology Letters, V1, P59, DOI 10.1109/68.87896
[9]   OPTICAL CAVITY DESIGN FOR LONG PULSE EXCIMER LASERS [J].
MCKEE, TJ .
APPLIED OPTICS, 1991, 30 (06) :635-644
[10]   COMPACT, WIDE APERTURE X-RAY PREIONIZED XECL LASER WITH HIGH SPECIFIC OPTICAL POWER [J].
STEYER, M ;
STANKOV, KA ;
MIZOGUCHI, H ;
OUYANG, B ;
SCHAFER, FP .
APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1989, 49 (04) :331-337