IRON OXIDE SEE-THROUGH PHOTOMASKS

被引：10

作者：

SULLIVAN, MV ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 04期

关键词：

IRON OXIDE;

D O I：

10.1149/1.2403497

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The decomposition of Fe(CO)//5 in an oxidizing atmosphere was employed to obtain a film of Fe//2O//3 2600 Angstron thick on a glass substrate. Using standard photoresist technology with dilute HCl as the etchant, see-through photomasks with 1 mu m patterned elements were obtained.

引用

页码：545 / 550

页数：6

共 6 条

[1]

ELO RB, PRIVATE COMMUNICATIO

[2] CHEMICAL VAPOR DEPOSITION OF IRON OXIDE FILMS FOR USE AS SEMITRANSPARENT MASKS [J].