EFFECT OF ELECTRICAL DISCHARGE ON SILANE AND AMMONIA

[1] ELECTRIC DISCHARGE REACTIONS OF METHYLSILANES [J]. JOURNAL OF THE CHEMICAL SOCIETY A -INORGANIC PHYSICAL THEORETICAL, 1971, (10): : 1424 - &

[2] DRAKE JE, 1962, CHEM IND-LONDON, P1470

[3] GOKHALE SD, 1965, J INORG NUCLEAR CHEM, V27, P911

[4] KONDRATEV VN, 1964, CHEMICAL KINETICS GA

[5] CHEMICAL SYNTHESIS FROM FREE RADICALS PRODUCED IN MICROWAVE FIELDS [J]. JOURNAL OF CHEMICAL PHYSICS, 1954, 22 (08) : 1360 - 1365

[6] THE PHOTOLYSIS OF AMMONIA AT 1849A IN A FLOW SYSTEM [J]. JOURNAL OF CHEMICAL PHYSICS, 1954, 22 (05) : 908 - 916

[7] OPTICAL THICKNESS MEASUREMENT OF SIO2-SI3N4 FILMS ON SILICON [J]. SOLID-STATE ELECTRONICS, 1967, 10 (07) : 625 - &

[8] STERLING HF, 1966, VIDE, P80

[9] STOCK A, 1953, HYDRIDES BORON SILIC

[10] PREPARATION AND PROPERTIES OF THIN FILM SILICON-NITROGEN COMPOUNDS PRODUCED BY A RADIO FREQUENCY GLOW DISCHARGE REACTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (07) : 713 - &

[1] ELECTRIC DISCHARGE REACTIONS OF METHYLSILANES [J]. JOURNAL OF THE CHEMICAL SOCIETY A -INORGANIC PHYSICAL THEORETICAL, 1971, (10): : 1424 - &

[2] DRAKE JE, 1962, CHEM IND-LONDON, P1470

[3] GOKHALE SD, 1965, J INORG NUCLEAR CHEM, V27, P911

[4] KONDRATEV VN, 1964, CHEMICAL KINETICS GA

[5] CHEMICAL SYNTHESIS FROM FREE RADICALS PRODUCED IN MICROWAVE FIELDS [J]. JOURNAL OF CHEMICAL PHYSICS, 1954, 22 (08) : 1360 - 1365

[6] THE PHOTOLYSIS OF AMMONIA AT 1849A IN A FLOW SYSTEM [J]. JOURNAL OF CHEMICAL PHYSICS, 1954, 22 (05) : 908 - 916

[7] OPTICAL THICKNESS MEASUREMENT OF SIO2-SI3N4 FILMS ON SILICON [J]. SOLID-STATE ELECTRONICS, 1967, 10 (07) : 625 - &

[8] STERLING HF, 1966, VIDE, P80

[9] STOCK A, 1953, HYDRIDES BORON SILIC

[10] PREPARATION AND PROPERTIES OF THIN FILM SILICON-NITROGEN COMPOUNDS PRODUCED BY A RADIO FREQUENCY GLOW DISCHARGE REACTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (07) : 713 - &