共 3 条
- [1] CANTAGREL M, 1973, J MATER SCI, V8, P1711, DOI 10.1007/BF02403521
- [2] KOSHIMOTO Y, 1977, T IECE C, V60
- [3] WALLACE RL, 1951, BSTJ OCT
NARROW TRACK MAGNETIC HEAD FABRICATED BY ION-ETCHING METHOD
被引：6
作者：
NAKANISHI, T
TOSHIMA, T
YANAGISAWA, K
TSUZUKI, N
机构：
[1] Musashino Electrical Communication Laboratory, NTT, Musashino-shi Tokyo
关键词：
D O I：
10.1109/TMAG.1979.1070323
中图分类号：
TM [电工技术];
TN [电子技术、通信技术];
学科分类号：
0808 ;
0809 ;
摘要：
Manufacturing narrow track magnetic heads is difficult as track widths become very narrow, A new flying-head manufacturing method is established by applying ion-etching. Optimum conditions for ion-etching of the ferrite material were determined. More than 10 µm ion-etched depth and even less than 5 µm track width were obtained. Through experimental and theoretical evaluation, it is proven that ion-etched heads have equivalent or better read/write characteristics than mechanically manufactured heads. Copyright © 1979 by The Institute of Electrical and Electronics Engineers, Inc.
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页码：1060 / 1064
页数：5
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